Electrochemical Properties of NiO thin Film Prepared by Sol-Gel Process



The thermal decomposition behavior of gel precursor, the structure, morphology and electrochemical properties of NiO thin films prepared by sol-gel process were characterized by thermogravimetric/differential scanning calorimetry (TG-DSC), X-ray diffraction (XRD), scanning electron microscopy (SEM) and constant current charge-discharge techniques. The results show that the gel precursor completely decomposes and gradually forms the nanocrystalline NiO at 450°C during the sintering. The NiO thin film is smooth, uniform and free of cracks drying at 200°C as pretreatment and sintering at a low temperature rise rate. The structure of NiO films sintered at 500°C for 2h becomes integrity, whose discharge capacity after 20 cycles remains at 714mAh/g. It is promising to be used in Li-ion battery for great initial specific capacity and well cycle performances.




Jianmin Zeng, Taosen Li, Shaojian Ma, Zhengyi Jiang and Daoguo Yang




J. N. Zhu et al., "Electrochemical Properties of NiO thin Film Prepared by Sol-Gel Process", Advanced Materials Research, Vols. 194-196, pp. 2487-2490, 2011


February 2011




[1] I. Yasutoshi, Y. Chihiro, A. Takeshi, O. Zempachi and K. Kenji: J. Electrochemical communications. Vol. 8 (2006) 1287.

[2] B. Wang, M.Z. Ju, Z.L. Yu: J. Chinese Chemical Bulletin. Vol. 69 (2006) 46.

[3] X.H. Huang, J. Tu and X. Xia: J. Electrochemistry Communications. Vol. 10 (2008) 1288.

[4] X.H. Huang, J. Tu, X. Xia and X.L. Wang: Journal of Power Sources. Vol. 188 (2009), p.588.

[5] A.C. Sonavane and A.I. Inamdar: Journal of Alloys and Compounds. Vol. 489 (2010), p.667.

[6] M. Martini, G.E. Brito, M.C. Fantini: J. Electrochimica Acta. Vol. 46 (2001), p.2275.

[7] J.M. Yan, J. Zhang and Y. Yang: J. Electrochemistry. Vol. 11 (2005), p.285.

[8] J.F. Cheng, S. Li and S.J. Ji: J. Functional Materials. Vol. 33 (2002), p.298.

[9] F. B. Zhang, Y. K. Zhou and H. L. Li: Mater Chem Phys. Vol. 83 (2004), p.260.