Defect and Diffusion Forum

ISSN: 1662-9507

主要主题

编辑: D.J. Fisher
上线时间: August 2001
描述: This phenomenon (also known as the Compensation Effect) can occur in any situation which involves an activated process. However, the rule is still most commonly referred to in connection with diffusion phenomena. As the rule still tends to exist in a sort of limbo between fully accepted physical law and unexplained correlation, this volume presents a handy survey of relevant diffusion data reaching back as far as the 1930s.

192-193

编辑: R.P. Agarwala
上线时间: January 2001
描述: Recent advances in solid-state chemistry have resulted in substantial progress towards achieving a better understanding of the solid state, and have even led to the development of new predictive capabilities in crystal chemistry. Entirely new ways of studying and preparing advanced materials have been the result of pursuing the so-called "soft chemistry" approach to materials science.

191

编辑: D.J. Fisher
上线时间: January 2001
描述: This latest annual look back at the subject includes review papers on some applications of mechanical spectroscopy and magnetic relaxation to the monitoring of diffusion, on the effect of positron diffusion upon their annihilation, on the wind force in electromigration, on the creep of nanocrystalline metals (as related to grain-boundary diffusion) and on self-interstitial atom behaviour at high temperatures in dense metals.

188-190

编辑: D.J. Fisher
上线时间: December 2000
描述: This is the third special issue to cover recent progress in the field. As usual, priority in abstracting has been given to the most accessible work and, in particular, to those papers which furnish original data or report important new techniques, phenomena or anomalies; although there is also extensive coverage of more qualitative features of diffusion and defect phenomena, of the predictions of computer models, and of theoretical studies. As before, the usual definition of ‘ceramic’ has been widened so as to include all forms of carbon, and also some nitrides whose primary use is not that of a classical ceramic.

186-187

编辑: D.J. Fisher
上线时间: August 2000
描述: The third annual retrospective of the latest results in the field of defects and diffusion in semiconductors covers the period from mid-1999 to mid-2000. As usual, the coverage also includes, in addition to 'traditional' semiconductors, the more important of the nitride and silicide semiconductors.

183-185

编辑: D.J. Fisher
上线时间: May 2000
描述: Halides continue to be an increasingly important industrial engineering resource: as electrolytes, and in heat-treatment baths on the one hand, and as the basis of exotic devices in the fields of optics, electronics, etc., on the other. At both of these extremes, the gross or detailed movements of ions, respectively, are important factors. There may also be an important geological need for a knowledge of halide diffusion data, in an era when the migration – or not - of various waste materials, including nuclear, through natural seams of halide-based minerals is of great concern.

181-182

编辑: D.J. Fisher
上线时间: February 2000
描述: “Dislocation Theory” covers the research into this fascinating field which was reported in the period: 1995-1999. The coverage is limited to purely theoretical work; more practical aspects having certainly been covered by the relevant DDF volumes during that period. As indicated above, the widest possible range of dislocation phenomena has been included; with the exception of liquid crystal defects. But the coverage also includes that close relative of the dislocation; the disclination.

179-180

编辑: D.J. Fisher
上线时间: February 2000
描述: This is the second issue, following DDF164, to cover recent progress in this field. The contents are contiguous with those of DDF164, and extend to late November or December 1999 (depending upon journal publication dates). As usual, priority in abstracting has been given to the most accessible work and, in particular, to those papers which furnish original data or report important new techniques, phenomena or anomalies, although there is also extensive coverage of more qualitative features of diffusion and defect phenomena, and of the predictions of computer models.

177-178

编辑: D.J. Fisher
上线时间: January 2000
描述: This is the second issue, following DDF165-166, to cover recent progress in this field. As usual, priority in abstracting has been given to the most accessible work and, in particular, to those papers which furnish original data or report important new techniques, phenomena or anomalies, although there is also extensive overage of more qualitative features of diffusion and defect phenomena, of the predictions of computer models, and of theoretical studies.

175-176

编辑: D.J. Fisher
上线时间: August 1999
描述: This group of materials tends to be relatively neglected, with regard to defect and diffusion studies, when compared with the other major semiconductor groups such as the elementals (Si, Ge) and the III-V compounds (especially GaAs). This is reflected by the fact that the volume of diffusion data is smaller than that for the other groups (see DDF volumes 153-155 on Si and volumes 157-159 on GaAs). Nevertheless MCT (HgCdTe), here classified as part of the (Cd,Hg)Te system, continues to be of great interest and this is reflected by the contents of this volume. In particular, the first of the original works in this book reviews the topic of diffusion in MCT.

173-174

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