Metal Leadframe Surface Cleaning Prior to Electroplating by Atmospheric Pressure Glow Discharge Plasma

摘要:

文章预览

Metal leadframes (Alloy 42) were cleaned using atmospheric pressure glow discharge plasma. Atmospheric pressure glow plasma was generated by a RF source of 13.56MHz with a matching network (300W power) on to the leadframes free from streamers and arc. Argon (Ar) and oxygen (O2) were used as the carrier gas and reactive gas, respectively. The addition of O2 gas to Ar decreased the contact angle of water and increased the surface cleaning rate due to the ncrease of oxygen radicals in the plasma. The chemical characteristics and morphologies of leadframe surface after the plama treatment were analyzed using X-ray photoelectron spectroscopy (XPS) and atomic force microscope (AFM), respectively. The contact angle of 82° before the plasma treatment was decreased to 5° in the processing condition with oxygen flow rate of 50sccm, treatment speed of 100mm/sec, and input power of 300W. These surface cleaning effect will be very useful in the replacement many steps of wet cleaning before electroplating.

信息:

期刊:

编辑:

Young-Jin Kim, Dong-Ho Bae and Yun-Jae Kim

页数:

869-874

引用:

J. H. Cho et al., "Metal Leadframe Surface Cleaning Prior to Electroplating by Atmospheric Pressure Glow Discharge Plasma ", Key Engineering Materials, Vols. 297-300, pp. 869-874, 2005

上线时间:

November 2005

输出:

价格:

$38.00

[1] R. Hansen, M. Bissen, D. Wallace and J. Wolske: Appl. Optics. Vol. 32 (1993), p.4114.

[2] J. Deffeyes, H. Lilenfeld, J. Reilly and P. Mykytiuk: SAMPE J. Vol. 33 (1997), p.58.

[3] C. Yi, C. Jeong, Y. Lee, Y. Ko and G. Yeom: Surface and Coatings Technol. Vol. 177-178 (2004), p.711.

[4] M. Kim, D. Song, H. Shin, S. Baeg, G. Kim, J. Boo, J. Han and S. Yang: Surface and Coatings Technol. Vol. 171 (2003), p.312.

[5] X. Xu: Thin Solid Films Vol. 390 (2001), p.237.

[6] M. Abdiflahl: Applied Spectroscopy Vol. 47 (1993), p.366.

[7] K. Onda, Y. Kasuga, K. Kato, M. Fujiwara and M. Tanimoto: Energy Conversion and Management Vol. 38 (1997), p.1377.

[8] S. Moon, W. Choe, B. Kang: Applied Physics Letters, Vol. 84 (2004), p.188.

[9] J. Moulder, W. Stickle, P. Sobol and K. Bomben: Handbook of X-ray Photoelectron Spectroscopy (Physical Electronics Inc., United States of America 1995).

[10] N. Cui and N. Brown: Applied Surface Science Vol. 189 (2002), p.31.

[11] G. Beamson, D. Clark, J. Kendrick and D. Briggs: J. Electron Spec. Related Phenom. Vol. 57 (1991), p.79.

[12] M. Kim, D. Song, H. Shin, S. Baeg, G. Kim, J. Boo, J. Han and S. Yang: Surface and Coatings Technol. Vol. 171 (2003), p.312.

从Crossref获取数据。
这可能需要一些时间来加载。