A Study of Defects in SiO2 Films on Si by Variable-Energy Positron Annihilation Spectroscopy

摘要:

文章预览

信息:

期刊:

编辑:

Yuan-Jin He, Bi-Song Cao and Y.C. Jean

页数:

157-160

DOI:

10.4028/www.scientific.net/MSF.175-178.157

引用:

M. Fujinami and N.B. Chilton, "A Study of Defects in SiO2 Films on Si by Variable-Energy Positron Annihilation Spectroscopy", Materials Science Forum, Vols. 175-178, pp. 157-160, 1995

上线时间:

November 1994

输出:

价格:

$35.00

为了查看相关信息, 需 Login.