Organometallic Compounds as Precursors for Chemical Vapor Deposition of Thin Films of Inorganic Materials

摘要:

文章预览

信息:

期刊:

编辑:

Dragan P. Uskokovic, Slobodan K. Milonjic, Dejan I. Rakovic

页数:

123-130

引用:

P. Zanella et al., "Organometallic Compounds as Precursors for Chemical Vapor Deposition of Thin Films of Inorganic Materials", Materials Science Forum, Vols. 282-283, pp. 123-130, 1998

上线时间:

May 1998

输出:

价格:

$38.00